Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation
Hua Shen1, Rihong Zhu1, Qing Wang1, and Linhua Xu2
Chinese Optics Letters , Vol.08 , Issue s1 , PP.78-82(2010)

Keywords(OCIS Code)
240.0310

Abstract
Until now, there are few reports on the effect of process conditions on abrasion resistance, which is the most important mechanical property of optical films. Broadband antireflective (AR) films composed of SiO2and TiO2, whose bands are from 620 to 860 nm and whose reflectivity is less than 0.5%, are prepared by electron-beam evaporation (EBE) at different temperatures, ion beam energies, and cooldown times. The structural properties of the films are investigated by atomic force microscopy, including the surface roughness, crystallinity, shape, uniformity, and compactness of the grain. The abrasion resistance of the samples is tested according to MIL-C-48497A4.5.5.1 standard. We discuss the relationship between abrasion resistance and the structural properties produced under different process conditions, such as preparation temperature, energy of the ion beam, and cooldown time. Grain shape and surface roughness are indicated to codetermine the abrasion resistance of the film. Further, the AR film with triangular grain and moderate roughness shows good abrasion resistance.

©2003-2007 Chinese Optics Letters

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