Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering
Stefan Jakobs1, Marc Lappschies1, Uwe Schallenberg1, Olaf Stenzel2, and Steffen Wilbrandt2
Chinese Optics Letters , Vol.08 , Issue s1 , PP.73-77(2010)

Keywords(OCIS Code)
310.1860; 310.6860

Abstract
For single layers of SiO2, Nb2O5, and Ta2O5 that are deposited by plasma-assisted reactive magnetron sputtering (PARMS), we present measurement results for basic optical and mechanical properties, in particular, optical index, intrinsic film stress, thermal shift of spectral transmittance, and microroughness. We find high refractive indices combined with low intrinsic film roughness, moderate compressive stress, and almost a vanishing shift, indicate high potential for the production of high-performance optical coatings. The high thickness accuracy and process stability are exemplified by the measured spectral performance of multilayer stacks with about 200 single layers.

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Note: This work was supported by the German Federal Ministry of Economics and Technology under Grant No. EP090031. We are grateful to L. Coriand and A. Duparre (Fraunhofer IOF) for their extremely useful microtopography measurements and PSD calculations, and to G. K¨uhne (Fraunhofer IOF) for measurements on film stress.

References

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