Plasma ion-assisted deposition in UV filters
Xiaojun Yin1, Shuaifeng Zhao1, Shuguo Fei1, Peng Gao1, Ruisheng Wang1, Jing Ma2, Shu Song2, and Bangjun Liao2
Chinese Optics Letters , Vol.08 , Issue s1 , PP.59-61(2010)

Keywords(OCIS Code)
310.0310; 310.1620

Abstract
Plasma ion-assisted deposition (PIAD) process for ultraviolet (UV)-induced transmission and full dielectric thin-film filters in the 200–400 nm spectral region is described. The design and manufacturing method of the UV filters are introduced. The UV filters exhibit deep blocking (> optical density (OD)5–OD6), high transmittance, and stable environment durability. These UV filters pass 10 cycles in an aggravated temperature-humidity test, according to ISO9022-2 and MIL-STD-810F standards.

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