Design of shallow-etched multilayer dielectric grating with –1st order high diffraction efficiency
Jianpeng Wang1;2, Yunxia Jin1, Shijie Liu1, Jianda Shao1, and Zhengxiu Fan1
Chinese Optics Letters , Vol.08 , Issue s1 , PP.29-31(2010)

Keywords(OCIS Code)
050.0050; 050.1940; 050.1950; 050.2770; 310.0310

Abstract
A new design of shallow-etched multilayer dielectric grating (MDG) exhibiting a diffraction efficiency (DE) of approximately 100% in the –1st order at 1064-nm wavelength in Littrow mounting is reported. Particle swarm optimization algorithm and Fourier modal method are used to design MDG and calculate the DE of MDG. The thickness of the grating layer is less than 80 nm which is much shallower than that in the currently reported MDG design for a high DE, which is greatly helpful for the MDG etching process. Meanwhile, the bandwidth of DE which is more than 97.5% of MDG is 60 nm, and it is a meaningful result for MDG to be used in ultrashort pulse compression system.

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Note: This work was supported by the National Natural Science Foundation of China under Grant No. 10704079.

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